耐等离子陶瓷涂层的全面调查化学分析

王新伟博士和Karol Putyera博士

挑战与要求

通常,在半导体工业中,尤其是在液晶显示器(LCD)制造中,涉及多个过程 等离子蚀刻等离子清洁。 The high-speed plasma stream can be extremely corrosive to manufacturing compartments and the surfaces that are exposed to the plasma resulting in formations of residual particles.高速等离子体流对制造室和暴露于等离子体的表面可能极具腐蚀性,导致形成残留颗粒。 Consequently, particles formed in chambers can contaminate substrates that are being processed, thus contributing to device defects.因此,在腔室中形成的颗粒会污染正在处理的基板,从而导致器件缺陷。 To minimize particle formations, plasma resistant ceramic coatings are required on various components exposed to plasma including the plasma etcher, the plasma cleaner, or the plasma propulsion system, such as the chamber walls, bases, gas distribution plates, rings, view ports, lids, nozzles, shower heads, substrate holding frames, electrostatic chucks, face plates, and selectivity modulation devices, among others.为了最大程度地减少颗粒的形成,需要在暴露于等离子体的各种组件(包括等离子刻蚀机,等离子清洁器或等离子推进系统)(例如腔室壁,底座,气体分配板,环,观察孔,盖)上使用抗等离子陶瓷涂层。 ,喷嘴,淋浴喷头,基板固定架,静电吸盘,面板和选择性调制装置等。

Plasma resistant ceramic coatings under development or currently in active use, are typically multi-layered structures that provide plasma erosion resistance, rigidity, conformability to substrate and thermal shock resistance.正在开发或当前正在使用的抗等离子体陶瓷涂层通常是多层结构,可提供抗等离子体侵蚀,刚性,对基材的顺应性和抗热震性。 Rare earth oxide, alumina, carbides, and nitrides based ceramic materials are currently used and/or under further developments.当前使用和/或在进一步发展中的基于稀土氧化物,氧化铝,碳化物和氮化物的陶瓷材料。 Coating precursors include ceramic powders, sintered ceramic solids, metal and metal alloy targets, and metal halides, depending on the component substrate materials, coating technique and application environment.涂层前体包括陶瓷粉末,烧结的陶瓷固体,金属和金属合金靶以及金属卤化物,具体取决于组件基材的材料,涂层技术和应用环境。

陶瓷涂层的全化学分析

高分辨率 辉光放电质谱(GDMS) is recognized as one of the most versatile direct sampling techniques for survey chemical analysis of solids.是公认的用于固体化学分析的最通用的直接采样技术之一。 The glow-discharge plasma source combined with high-resolution mass analyzer is suitable to evaluate mass fractions in solids directly and with very high sensitivity.辉光放电等离子体源与高分辨率质量分析仪相结合,适用于直接评估固体中的质量分数,并且灵敏度很高。

耐等离子陶瓷涂料

(b)使用具有六个采样孔的铟掩膜的等离子体雾化斑点。 (c)等离子雾化的陨石坑横截面轮廓。 Sampling orifice diameter ~ Ф 1 mm;采样孔直径〜Ф3 mm; average sputtering depth ~ 10 μm.平均溅射深度〜20μm。

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