Chemical Analysis of Plasma Resistant Ceramic Coatings Webinar

In the full webinar we will focus Full Survey Chemical Analysis of Plasma Resistant Ceramic Coatings using GDMS.

In semiconductor and liquid crystal display (LCD) manufacturing, several processes involve plasma etch and plasma clean. The high-speed plasma stream plasma can be extremely corrosive to chambers and other surfaces that are exposed to the plasma, generating particles which frequently contaminate the substrate that is being processed, contributing to device defects. To minimize particle contamination introduced by plasma etch and/or plasma clean processes, plasma-resistant ceramic coatings have been developed and applied on various components exposed to plasma. This brings about another challenge, “how clean is the plasma resistant ceramic coating”?

In this lecture , we will demonstrate Direct Solid Sampling GDMS as an effective tool for trace analysis of plasma-resistant ceramic coatings such as Y₂O₃, YF₃, Y₂O₃/Al₂O₃, Y-Stabilized Zirconia, CVD-SiC, and many others. Stable sputtering can be achieved by using high purity indium as mask to initiate and maintain plasma sputtering. High matrix ion signal (up to 10⁹ cps), can be maintained through the data acquisition, with signal intensity variation within 10% RSD, which is comparable to analysis of metal samples. Limit of detection at sub-ppm can be readily achieved for most elements in the periodic table, from Li to U. Good precision (e.g., 10-40% RSD) was demonstrated for trace analysis of a Y-stabilized zirconia reference material.