Atomic Layer Deposition (ALD) Analysis
How do you characterize thin films? How do you troubleshoot Atomic Layer Deposition (ALD) product failures? How do you determine crystal structure?
Ask EAG. WE KNOW HOW.
EAG Laboratories has been helping product innovators with atomic layer deposition (ALD) support for over 20 years.
Our scientists and engineers provide the fast and actionable information you need for ALD development. We explain
what the data means, helping to troubleshoot problems and avoid development hurdles.
EAG knows that every minute counts. Our experts use the right techniques from our laboratories’ extensive range of instrumentation. Providing customized atomic layer deposition protocols with ultimate depth resolution, EAG can help you meet specifications with on-time and accurate results. From determining composition and detecting contaminants to understanding thin film structures, we support all phases of product development and life-cycle management.
EAG’s Services Supporting ALD Development
Our ALD research and development services include:
- Composition
- Contaminant identification
- Thickness
- Uniformity
- Density
- Roughness
- Thermal stability
- Crystallinity
EAG’s pilot process and ramp-up services are:
- Materials purity
- Compositional analysis
- Tool matching
- Process monitoring
- Failure analysis
For production support we offer process monitoring and validation measurement. At post-commercialization we provide failure analysis at the circuit, chip, board and system level, as well as supplier material verification and failure analysis projects.
Would you like to learn more about Atomic Layer Deposition (ALD) Analysis?
Contact us today for your Atomic Layer Deposition (ALD) analysis needs. Please complete the form below to have an EAG expert contact you.