In the semiconductor industry in general and particularly in liquid crystal display (LCD) manufacturing, several processes involve plasma etch and plasma clean. The high-speed plasma stream can be extremely corrosive to manufacturing compartments and the surfaces that are exposed to the plasma resulting in formations of residual particles. Consequently, particles formed in chambers can contaminate substrates that are being processed, thus contributing to device defects. To minimize particle formations, plasma resistant ceramic coatings are required on various components exposed to plasma including the plasma etcher, the plasma cleaner, or the plasma propulsion system, such as the chamber walls, bases, gas distribution plates, rings, view ports, lids, nozzles, shower heads, substrate holding frames, electrostatic chucks, face plates, and selectivity modulation devices, among others.